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authorElisis <gtandemmodding@gmail.com>2024-08-24 05:18:09 +1000
committerGitHub <noreply@github.com>2024-08-23 19:18:09 +0000
commit71e7f3dc16a7be69a3f89c17a170d401383bf021 (patch)
tree2b4f74c3edfdefc2152fb0dd245916e6eb3222f5 /src/main/java/com/elisis/gtnhlanth/common/item
parent0dc1b9feefc03c16efe66e14c5b8707214693658 (diff)
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General beamline fixes, balancing (#2899)
* Remove cell chemistry, increase tiering of recipes from mask-making process * Fix LN2 and LOX in LINAC and Synchrotron * Fix Synchrotron structure definition antenna having a different meta to the actual block * Fix Accelerator Glass Hardness * Fix mobs spawning inside Synchrotron, make LiB6 rods less painful to make * Halve TC base recipe duration, loosen focus requirements for lower-tier wafers, add more detail to LINAC TT * Improve LINAC output energy eu/t scaling * Remove log * Spotless * Remove merge artifact * Spotless apply for branch beamline-fixes-2 for #2899 (#2900) spotlessApply Co-authored-by: GitHub GTNH Actions <> --------- Co-authored-by: github-actions[bot] <41898282+github-actions[bot]@users.noreply.github.com> Co-authored-by: Martin Robertz <dream-master@gmx.net> Co-authored-by: Connor-Colenso <52056774+Connor-Colenso@users.noreply.github.com>
Diffstat (limited to 'src/main/java/com/elisis/gtnhlanth/common/item')
-rw-r--r--src/main/java/com/elisis/gtnhlanth/common/item/MaskList.java81
1 files changed, 48 insertions, 33 deletions
diff --git a/src/main/java/com/elisis/gtnhlanth/common/item/MaskList.java b/src/main/java/com/elisis/gtnhlanth/common/item/MaskList.java
index bbc2d1c18a..18423565ca 100644
--- a/src/main/java/com/elisis/gtnhlanth/common/item/MaskList.java
+++ b/src/main/java/com/elisis/gtnhlanth/common/item/MaskList.java
@@ -4,6 +4,7 @@ import net.minecraft.item.ItemStack;
import gregtech.api.enums.Dyes;
import gregtech.api.enums.ItemList;
+import gregtech.api.enums.TierEU;
public enum MaskList {
@@ -12,53 +13,60 @@ public enum MaskList {
// Use Dyes._NULL to indicate a wafer's lack of a dedicated lens instead of null, if the wafer's mask is to be
// generated
// Ignore last argument if using all wafers
- ERROR("error", "ERROR", 0, "", null, null, 0, 0, 0, 0, null),
- BLANK1("blank1", "T1 Blank", 0, "VISIBLE", null, null, 0, 0, 0, 0, null),
- BLANK2("blank2", "T2 Blank", 0, "UV", null, null, 0, 0, 0, 0, null),
- BLANK3("blank3", "T3 Blank", 0, "X-RAY", null, null, 0, 0, 0, 0, null),
- ILC("ilc", "Integrated Logic Circuit", 100, "", BLANK1, Dyes.dyeRed, 0.5e-3f, 4e-3f, 50, 1,
+ ERROR("error", "ERROR", 0, "", null, null, 0, 0, 0, 0, 0, null),
+ BLANK1("blank1", "T1 Blank", 0, "VISIBLE", null, null, 0, 0, 0, 0, 0, null),
+ BLANK2("blank2", "T2 Blank", 0, "UV", null, null, 0, 0, 0, 0, 0, null),
+ BLANK3("blank3", "T3 Blank", 0, "X-RAY", null, null, 0, 0, 0, 0, 0, null),
+ ILC("ilc", "Integrated Logic Circuit", 100, "", BLANK1, Dyes.dyeRed, TierEU.RECIPE_MV, 0.5e-3f, 4e-3f, 35, 1,
ItemList.Circuit_Wafer_ILC.get(1)),
- RAM("ram", "Random Access Memory", 200, "", BLANK1, Dyes.dyeCyan, 2e-3f, 4e-3f, 60, 2,
+ RAM("ram", "Random Access Memory", 200, "", BLANK1, Dyes.dyeCyan, TierEU.RECIPE_MV, 2e-3f, 4e-3f, 40, 2,
ItemList.Circuit_Wafer_Ram.get(1), ItemList.Circuit_Silicon_Wafer),
- NAND("nand", "NAND", 200, "", BLANK2, Dyes._NULL, 7e-3f, 12e-3f, 50, 1, ItemList.Circuit_Wafer_NAND.get(1),
- ItemList.Circuit_Silicon_Wafer), // NAND uses only Ender Pearl lens, don't ask me why
- NOR("nor", "NOR", 100, "", BLANK2, Dyes._NULL, 8e-3f, 10e-3f, 50, 1, ItemList.Circuit_Wafer_NOR.get(1),
- ItemList.Circuit_Silicon_Wafer, ItemList.Circuit_Silicon_Wafer2), // Same as above, but with ender eye
- CPU("cpu", "Central Processing Unit", 10, "", BLANK2, Dyes.dyeWhite, 6e-3f, 12e-3f, 50, 2,
+ NAND("nand", "NAND", 200, "", BLANK2, Dyes._NULL, TierEU.RECIPE_HV, 7e-3f, 12e-3f, 40, 1,
+ ItemList.Circuit_Wafer_NAND.get(1), ItemList.Circuit_Silicon_Wafer), // NAND uses only Ender Pearl lens, don't
+ // ask me why
+ NOR("nor", "NOR", 100, "", BLANK2, Dyes._NULL, TierEU.RECIPE_LuV, 8e-3f, 10e-3f, 40, 1,
+ ItemList.Circuit_Wafer_NOR.get(1), ItemList.Circuit_Silicon_Wafer, ItemList.Circuit_Silicon_Wafer2), // Same as
+ // above,
+ // but with
+ // ender
+ // eye
+ CPU("cpu", "Central Processing Unit", 10, "", BLANK2, Dyes.dyeWhite, TierEU.RECIPE_MV, 6e-3f, 12e-3f, 45, 2,
ItemList.Circuit_Wafer_CPU.get(1)),
- SOC("soc", "SoC", 150, "", BLANK2, Dyes.dyeYellow, 3e-3f, 10e-3f, 50, 2, ItemList.Circuit_Wafer_SoC.get(1),
- ItemList.Circuit_Silicon_Wafer, ItemList.Circuit_Silicon_Wafer2),
- ASOC("asoc", "Advanced SoC", 120, "", BLANK2, Dyes.dyeGreen, 100e-3f, 200e-3f, 50, 2,
+ SOC("soc", "SoC", 150, "", BLANK2, Dyes.dyeYellow, TierEU.RECIPE_EV, 3e-3f, 10e-3f, 45, 2,
+ ItemList.Circuit_Wafer_SoC.get(1), ItemList.Circuit_Silicon_Wafer, ItemList.Circuit_Silicon_Wafer2),
+ ASOC("asoc", "Advanced SoC", 120, "", BLANK2, Dyes.dyeGreen, TierEU.RECIPE_EV, 100e-3f, 200e-3f, 50, 2,
ItemList.Circuit_Wafer_SoC2.get(1), ItemList.Circuit_Silicon_Wafer, ItemList.Circuit_Silicon_Wafer2),
- PIC("pic", "Power IC", 100, "", BLANK2, Dyes.dyeBlue, 5e-3f, 10e-3f, 50, 4, ItemList.Circuit_Wafer_PIC.get(1),
- ItemList.Circuit_Silicon_Wafer),
- HPIC("hpic", "High Power IC", 80, "", BLANK3, null, 100e-3f, 200e-3f, 50, 6, ItemList.Circuit_Wafer_HPIC.get(1),
- ItemList.Circuit_Silicon_Wafer), // Different, made in chemical reactor. Figure out something for
+ PIC("pic", "Power IC", 100, "", BLANK2, Dyes.dyeBlue, TierEU.RECIPE_HV, 5e-3f, 10e-3f, 50, 4,
+ ItemList.Circuit_Wafer_PIC.get(1), ItemList.Circuit_Silicon_Wafer),
+ HPIC("hpic", "High Power IC", 80, "", BLANK3, null, TierEU.RECIPE_IV, 100e-3f, 200e-3f, 50, 6,
+ ItemList.Circuit_Wafer_HPIC.get(1), ItemList.Circuit_Silicon_Wafer), // Different, made in chemical reactor.
+ // Figure out something for
// this later?
- NCPU("ncpu", "NanoCPU", 60, "", BLANK2, null, 5e-3f, 10e-3f, 50, 4, ItemList.Circuit_Wafer_NanoCPU.get(1),
- ItemList.Circuit_Silicon_Wafer), // Same as above
- QBIT("qbit", "QBit", 50, "", BLANK2, null, 3e-3f, 10e-3f, 50, 4, ItemList.Circuit_Wafer_QuantumCPU.get(1),
- ItemList.Circuit_Silicon_Wafer), // ^
- UHPIC("uhpic", "Ultra High Power IC", 60, "", BLANK3, null, 200e-3f, 400e-3f, 50, 8,
+ NCPU("ncpu", "NanoCPU", 60, "", BLANK2, null, TierEU.RECIPE_EV, 5e-3f, 10e-3f, 50, 4,
+ ItemList.Circuit_Wafer_NanoCPU.get(1), ItemList.Circuit_Silicon_Wafer), // Same as above
+ QBIT("qbit", "QBit", 50, "", BLANK2, null, TierEU.RECIPE_EV, 3e-3f, 10e-3f, 50, 4,
+ ItemList.Circuit_Wafer_QuantumCPU.get(1), ItemList.Circuit_Silicon_Wafer), // ^
+ UHPIC("uhpic", "Ultra High Power IC", 60, "", BLANK3, null, TierEU.RECIPE_LuV, 200e-3f, 400e-3f, 50, 8,
ItemList.Circuit_Wafer_UHPIC.get(1), ItemList.Circuit_Silicon_Wafer, ItemList.Circuit_Silicon_Wafer2), // You
// get
// the
// gist
- SSOC("ssoc", "Simple SoC", 150, "", BLANK1, Dyes.dyeOrange, 2e-3f, 4e-3f, 50, 1,
+ SSOC("ssoc", "Simple SoC", 150, "", BLANK1, Dyes.dyeOrange, TierEU.RECIPE_MV, 2e-3f, 4e-3f, 25, 1,
ItemList.Circuit_Wafer_Simple_SoC.get(1)),
- ULPIC("ulpic", "Ultra Low Power IC", 200, "", BLANK1, Dyes.dyeGreen, 2e-3f, 4e-3f, 50, 1,
+ ULPIC("ulpic", "Ultra Low Power IC", 200, "", BLANK1, Dyes.dyeGreen, TierEU.RECIPE_LV, 2e-3f, 4e-3f, 30, 1,
ItemList.Circuit_Wafer_ULPIC.get(1)), // Can use green for this as well as asoc, given
// the latter uses a different base mask
- LPIC("lpic", "Low Power IC", 150, "", BLANK1, Dyes.dyeYellow, 2e-3f, 4e-3f, 50, 2,
+ LPIC("lpic", "Low Power IC", 150, "", BLANK1, Dyes.dyeYellow, TierEU.RECIPE_MV, 2e-3f, 4e-3f, 30, 2,
ItemList.Circuit_Wafer_LPIC.get(1)), // Same as above, except for yellow
- NPIC("npic", "Nano Power IC", 70, "", BLANK3, Dyes.dyeRed, 1, 100000, 50, 4, ItemList.Circuit_Wafer_NPIC.get(1),
- ItemList.Circuit_Silicon_Wafer, ItemList.Circuit_Silicon_Wafer2, ItemList.Circuit_Silicon_Wafer3), // Same
- PPIC("ppic", "PPIC", 50, "", BLANK3, null, 10, 15, 50, 6, ItemList.Circuit_Wafer_PPIC.get(1),
+ NPIC("npic", "Nano Power IC", 70, "", BLANK3, Dyes.dyeRed, TierEU.RECIPE_LuV, 1, 100000, 50, 4,
+ ItemList.Circuit_Wafer_NPIC.get(1), ItemList.Circuit_Silicon_Wafer, ItemList.Circuit_Silicon_Wafer2,
+ ItemList.Circuit_Silicon_Wafer3), // Same
+ PPIC("ppic", "PPIC", 50, "", BLANK3, null, TierEU.RECIPE_ZPM, 10, 15, 50, 6, ItemList.Circuit_Wafer_PPIC.get(1),
ItemList.Circuit_Silicon_Wafer, ItemList.Circuit_Silicon_Wafer2, ItemList.Circuit_Silicon_Wafer3), // CR
// recipe
- QPIC("qpic", "QPIC", 50, "", BLANK3, Dyes.dyeBlue, 5, 9, 50, 6, ItemList.Circuit_Wafer_QPIC.get(1),
- ItemList.Circuit_Silicon_Wafer, ItemList.Circuit_Silicon_Wafer2, ItemList.Circuit_Silicon_Wafer3,
- ItemList.Circuit_Silicon_Wafer4); // Different base mask to PIC
+ QPIC("qpic", "QPIC", 50, "", BLANK3, Dyes.dyeBlue, TierEU.RECIPE_UV, 5, 9, 50, 6,
+ ItemList.Circuit_Wafer_QPIC.get(1), ItemList.Circuit_Silicon_Wafer, ItemList.Circuit_Silicon_Wafer2,
+ ItemList.Circuit_Silicon_Wafer3, ItemList.Circuit_Silicon_Wafer4); // Different base mask to PIC
String name;
String englishName;
@@ -69,6 +77,8 @@ public enum MaskList {
MaskList precursor;
Dyes lensColour;
+ long engraverEUt;
+
float minEnergy;
float maxEnergy;
@@ -80,7 +90,7 @@ public enum MaskList {
ItemList[] forbiddenWafers;
MaskList(String name, String englishName, int maxDamage, String spectrum, MaskList precursor, Dyes lensColour,
- float minEnergy, float maxEnergy, float minFocus, int baselineAmount, ItemStack producedItem,
+ long engraverEUt, float minEnergy, float maxEnergy, float minFocus, int baselineAmount, ItemStack producedItem,
ItemList... forbiddenWafers) {
this.name = name;
this.englishName = englishName;
@@ -88,6 +98,7 @@ public enum MaskList {
this.maxDamage = maxDamage;
this.precursor = precursor;
this.lensColour = lensColour;
+ this.engraverEUt = engraverEUt;
this.minFocus = minFocus;
this.minEnergy = minEnergy;
this.maxEnergy = maxEnergy;
@@ -120,6 +131,10 @@ public enum MaskList {
return this.lensColour;
}
+ public long getEngraverEUt() {
+ return this.engraverEUt;
+ }
+
public float getMinEnergy() {
return this.minEnergy;
}